STP-iXA2206C ISO250F

The STP-iXA2206 series magnetically levitated turbomolecular pump provides industry-leading performance and incorporates a small power supply into the onboard control unit – the latest technology of the well-established STP-iXA2205 series. The height of the pump is equal to the STP-A2203C and is also equal to the height of the STP-iXA2205 series without it’s power supply (iPS-1200). This fully integrated product offers easy installation and a small footprint as an all-in-one solution for all application tools.

• Plasma etch (chlorine, fluorine and bromine chemestries) for metal (aluminium), tungsten and dialectric (oxide) and polysilicon
• Electron cyclotron resonance (ECR) etch
• Film deposition CVD, PECVD, ECRCVD, MOCVD
• Sputtering
• Ion implantation source, beam line pumping and station

• Compact design including a fully integrated controller
• Innovative, self-sensing magnetic bearing system
• Digital 5-axis control
• Vibration levels reduced by 50% compared to the existing turbo pumps
• Can be configured to run corrosive processes

Inlet flange size	ISO250F/VG250/ICF305
Backing port size	KF40
Pump speed N2/Ar	2200/1900 ls-1
Compression ratio N2/H2	>108 / 1 x 104
Ultimate pressure	10-7 Pa (10-9 Torr)
Allowable backing pressure	266  Pa (2 Torr)
Max gas flow N2 * (water cooled only)	3000 sccm
	(5.07 Pam3s-1)
Max gas flow Ar * (water cooled only)	1400 sccm
	(2.36 Pam3s-1)
Rated speed	27000 rpm
Run-up time to 90% rated speed	<8 minutes
Mounting position	Any orientation
Input voltage	200-240 V
Max input power (without TMS)	1200 VA
Weight	62 kg

* The maximum gas flow is applicable under conditions that N₂ or Ar gas is pumped continuously with water cooling temperature between 15-25 °C and the backing pump (10,000 l/min size) is used. It is changed on condition.

Inlet port flange	VG250	ISO250F	ICF305
ØA	350	335	305
ØB	296	296	296
C	18	16	28
D	235	245	275
E	395	405	435
F	323	333	363
G	281	291	321
H	283	293	323
I	312	322	352