yt39b0130 - STP1003C ISO200F Inlet

STP1003C ISO200F Inlet



Edwards corrosion resistant STP1003C is a new turbomolecular pump for use in the most advanced of semiconductor applications. Edwards’s rotor technology gives class-leading performance for maximum process flexibility. This pump has been approved for use by major equipment manufacturers in the semiconductor and magnetic media industries.


Edwards is a leader in clean and dry vacuum technology. The first STP pumps were sold in 1983 and there are now over 120,000 installations worldwide. 85% are operating on semiconductor process tools where they demonstrate exceptional levels of reliability. STP pumps are the first choice for applications demanding high up-time, hydrocarbon-free pump­ing, minimal maintenance and low vibration.
  • Proven reliability.
  • Clean oil-free high vacuum.
  • Complete range from 300 to 4500 l s-1.
  • Application specific models.
  • Very low noise and vibration.
  • Low cost of ownership.
  • Virtually maintenance free.
  • Installation in any orientation.
  • Full remote control interface.
  • Supported globally by Edwards
Proven magnetic bearing technology
The rotor is entirely suspended by magnetic bearings so all contact between the rotor and the remainder of the pump is eliminated. As well as giving very low vibration, the elimination of contact means no bearing wear and no requirement for consequent pump maintenance.
UHV series
The Ultra High Vacuum series of magnetically levitated turbo molecular pumps are the products of choice for the semiconductor, surface science or high energy physics industries. They offer unrivalled reliability, performance, clean­liness and class leading low vibration levels. The pumps are all d.c. powered, eliminating the need for batteries, they use a half rack controller which features auto-tuning and advanced diag­nostic features. The range contains pumps with speeds from 300 l s-1 to 1300 l s-1 all of which are available in ISO or CF flange variants. 
Oil Free
All STP turbomolecular pumps are oil free. The use of magnetic bearings eliminates all hydrocarbon lubricants ensuring no contamination of the vacuum process from the turbomolecular pump. This feature is vital in the semiconductor industry (where device densities are constantly increasing) and in surface science or high energy physics applications (where even minute degrees of contamination disrupt measurements).
Maintenance free
Unlike conventional mechanical bearings, magnetic levitation means there is no frictional contact, eliminating sources of wear and vibration. This feature enables STP turbomolecular pumps to run for years with virtually no maintenance, reducing annual operating costs to a minimum and ensuring maximum up-time is achieved. This maintenance free feature can be particularly beneficial on processes producing chemical or radioactive contamination.
Vibration free
Magnetic levitation of the rotor results in an extremely low level of noise and vibration. Peak-to-peak vibration level is less than 0.02 µm. This amplitude remains constant throughout the life of the pump and is free from troublesome sub-harmonics
Automatic balancing system (ABS)
ABS is a unique patented devel­opment of 5-axis technology. If any rotor imbalance is introduced (by dep­osition of process by-products, for example), sensors in the pump detect changes in the rotor motion and compensate the magnetic bearing fields to allow the rotor to spin on its natural inertial axis. This minimizes the vibration transmitted to the inlet flange. ABS works at all pump rotational speeds.
Safety backup bearings
STP pumps have dry lubricated axial and radial mechanical bearings as safety backup bearings. These support the rotor and protect the pump in the event of a total disruption of magnetic sus­pension or a massive air inrush which overcomes the magnetic bearing stiffness. These high precision ball bearings are dry lubricated and are not in contact with the rotor during normal operation.
Optimized rotors
The multistage pure bladed rotors in the UHV pumps provide the high vacuums required for clear beam­lines on CD SEM machines, mass spectrometers and ion implanters. They provide optimum pumping performance with excellent light gas compression ratios. 
Corrosion resistant
To ensure a high level of resistance to corrosion, the corrosion resistant (C) and high throughput (H-C) pumps have nickel coated rotors/stators and pump inter­nals suitable for ion implantation and plasma etching. Further enhanced levels of protection are available on request.
Nitrogen purging
The corrosion resistant (C) pumps and the high throughput (H-C) pumps have a nitrogen purge facility, a constant flow of nitrogen through the pump dilutes corrosive gases minimizing their damage to the pumps motor and sensor coils.
TMS system
The Edwards Temperature Management System is available on a wide range of turbo pumps. It is designed to optimize the temperature within the pump, dramat­ically reducing the particle condensation within. This will not only considerably enhance the performance of the pump under harsh process conditions, but also increase its operational life.


  • Plasma etch (chlorine, fluorine and bromine chemistries) for metal (aluminum), tungsten and dielectric (oxide) and polysilicon
  • Electron cyclotron resonance (ECR) etch
  • Film deposition CVD, PECVD, ECRCVD, MOCVD
  • Sputtering
  • Ion implantation source, beam line pumping end station
  • MBE
  • Diffusion
  • Photo resist stripping
  • Crystal/epitaxial growth
  • Wafer inspection
  • Load lock chambers
  • Scientific instruments: surface analysis, mass spectrometry, electron microscopy
  • High energy physics: beam lines, accelerators
  • Radioactive applications: fusion systems, cyclotrons

Features and Benefits

Advanced rotor technology  
  • Maximized process flexibility
  • Oil free
  • Low vibration
  • High reliability
  • Maintenance free
  • Harsh process compatible (C version)
  • Increased life
Advanced controller design  
  • Auto tuning
  • Self diagnostic functions
  • d.c. motor drive
  • Battery-free operation
Compact design  
  • Small footprint
  • Half rack controller

Technical Data

Inlet flange ISO200F
Outlet port KF40
Purge port KF10
Pumping Speed
N2 1000 ls-1
H2 800 ls-1
Compression ratio
N2 >108
H2 105
Ultimate pressure with bake out heating (VG/ISO flange) 6.5x10-6 Pa (5x10-8 Torr)
Ultimate pressure with bake out heating (ICF flange) 10-7 Pa (10-9 Torr)
Max continuous outlet pressure 13 Pa

(0.1 Torr)
Rated speed 35000 rpm
Starting time 6 min
Max inlet flange temp 120 °C
Input voltage 100 to 120 (± 10) V a.c. or

to 240 (± 10) V a.c.
Power consumption at Start up 0.8 kVA
Pump weight 31 kg
Controller weight 9 kg


1. N2 2. He 3. H2


A. Electrical connector B. Outlet port C. Purge port
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